Magnonics represents a promising alternative to conventional electronics for the development of energy efficient computing platforms. In this context, the nanoscale engineering of spin textures is highly appealing for the development and realization of new nanomagnonic device concepts. Here, we show that reconfigurable nanopatterned spin textures can be used to manipulate spin waves. Magnetic domains and domain walls are written by thermally assisted magnetic scanning probe lithography (tam-SPL) in exchange bias systems. In such structures, we demonstrate through microfocused Brillouin Light Scattering and time resolved scanning transmission X-ray microscopy measurements, the channeling and propagation of confined spin waves. This work opens the way to the use of engineered spin-textures as building blocks of magnonics computing devices.
The search of novel tools controlling the physical and chemical properties of matter at the nanoscale is crucial for developing next-generation integrated systems, with applications ranging from computing to medicine. Here, we show that thermal scanning probe lithography (t-SPL) can be a flexible tool for manipulating with nanoscale precision the surface properties of a wide range of specifically designed systems. In particular, we show that via t-SPL, we pattern nanoscale chemical patterns on polymeric substrates, which are then used to specifically bind extracellular matrix (ECM) proteins to the polymer surface. We demonstrate that the concentration of immobilized proteins can be controlled by varying the tip temperature, so that nanoscale protein gradients can be created. On a different system, we show that, by performing t-SPL on a thin film magnetic multilayer, in an external magnetic field, we are able to write reversibly magnetic patterns with arbitrarily oriented magnetization and tunable magnetic anisotropy. This demonstrates that t-SPL represents a novel, straightforward and extremely versatile method for the nanoscale engineering of the physicalchemical properties in a wide variety of materials.
The chemistry of graphene oxide (GO) and its response to external stimuli such as temperature and light are not well understood and only approximately controlled. This understanding is however crucial to enable future applications of the material that typically are subject to environmental conditions. The nature of the initial GO is also highly dependent on the preparation and the form of the initial carbon material. Here, we consider both standard GO made from oxidizing graphite and layered GO made from oxidizing epitaxial graphene on SiC, and examine their evolution under different stimuli. The effect of the solvent on the thermal evolution of standard GO in vacuum is first investigated. <i>In situ</i> infrared absorption measurements clearly show that the nature of the last solvent in contact with GO prior to deposition on a substrate for vacuum annealing studies substantially affect the chemical evolution of the material as GO is reduced. Second, the stability of GO derived from epitaxial graphene (on SiC) is examined as a function of time. We show that hydrogen, in the form of CH, is present after the Hummers process, and that hydrogen favors the reduction of epoxide groups and the formation of water molecules. Importantly, this transformation can take place at room temperature, albeit slowly (~ one month). Finally, the chemical interaction (e.g. bonding) between GO layers in multilayer samples is examined with diffraction (XRD) methods, spectroscopic (IR, XPS, Raman) techniques, imaging (APF) and first principles modeling.