Elise Baylac Boissard
Process Engineer at STMicroelectronics
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Etching, Photomasks, Resistance, Semiconducting wafers, Data modeling, Printing, Photoresist processing, Reticles, Polymers, Optical proximity correction

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