Dr. Elizabeth Buitrago
Research Scientist at Paul Scherrer Institut
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Photon counting, Metrology, Data modeling, Deep ultraviolet, Metals, Scanners, Photons, Printing, Projection systems, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electroluminescence, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Ultraviolet radiation, Extreme ultraviolet, Line width roughness, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Stochastic processes, Floods, Chemically amplified resists

PROCEEDINGS ARTICLE | September 15, 2016
Proc. SPIE. 9926, UV and Higher Energy Photonics: From Materials to Applications
KEYWORDS: Lithography, Electron beam lithography, Diffraction, Optical lithography, Silicon, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Systems modeling, Diffraction gratings

SPIE Journal Paper | August 18, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Line width roughness, Fractal analysis, Extreme ultraviolet, Polymers, Diffusion, Scanning electron microscopy, Spatial frequencies, Photoresist materials, Extreme ultraviolet lithography, Polymethylmethacrylate

SPIE Journal Paper | July 15, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Electroluminescence, Extreme ultraviolet, Scanning electron microscopy, Chemically amplified resists, Lithography, Photomasks, Line edge roughness, Photoresist processing

Showing 5 of 15 publications
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