Dr. Elizabeth Buitrago
Research Scientist at Paul Scherrer Institut
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Metals, Deep ultraviolet, Photons, Absorption, Chemically amplified resists, Metrology, Printing, Line width roughness, Scanners, Lithography, Data modeling, Semiconducting wafers, Photon counting, Projection systems

Proceedings Article | 27 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Scanning electron microscopy, Photomasks, Electroluminescence, Printing, Line edge roughness, Semiconducting wafers

Proceedings Article | 27 March 2017 Presentation + Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Extreme ultraviolet lithography, Chemically amplified resists, Floods, Lithography, Extreme ultraviolet, Line edge roughness, Image processing, Image enhancement, Ultraviolet radiation, Scanners, Picosecond phenomena, Polymers, Line width roughness, Stochastic processes

Proceedings Article | 15 September 2016 Paper
Proc. SPIE. 9926, UV and Higher Energy Photonics: From Materials to Applications
KEYWORDS: Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Photoresist materials, Electron beam lithography, Diffraction gratings, Optical lithography, Diffraction, Silicon, Systems modeling

SPIE Journal Paper | 18 August 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Line width roughness, Fractal analysis, Extreme ultraviolet, Polymers, Diffusion, Scanning electron microscopy, Spatial frequencies, Photoresist materials, Extreme ultraviolet lithography, Polymethylmethacrylate

Showing 5 of 15 publications
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