Ellyn Yang
Principle Engineer at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Detection and tracking algorithms, Etching, Printing, Photomasks, Semiconductor manufacturing, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Logic, Optical lithography, Databases, Metals, Photomasks, Logic devices, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Manufacturing, Design for manufacturing, Optical proximity correction, Model-based design, Process modeling, Design for manufacturability

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