Dr. Elmar Platzgummer
CEO/Technology at IMS Nanofabrication GmbH
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 2 December 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Semiconductors, Optical lithography, Video, Microopto electromechanical systems, Photomasks

Proceedings Article | 12 November 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Etching, Scanning electron microscopy, Photomasks, Double patterning technology, SRAF, Vestigial sideband modulation

Proceedings Article | 31 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanofabrication, Photomask technology

Proceedings Article | 25 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Optical microscopes, Inspection, Scanning electron microscopy, Photomasks, Line width roughness, Beam shaping, Optical proximity correction, Nanofabrication, Standards development, Vestigial sideband modulation

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Metrology, Logic, Calibration, Inspection, Image registration, Photomasks, Line width roughness, Beam shaping, Nanofabrication, Vestigial sideband modulation

Showing 5 of 36 publications
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