Dr. Elyakim Kassel
at KLA Israel
SPIE Involvement:
Publications (12)

Proceedings Article | 28 March 2008 Paper
L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross, C. Klein, H. Loeschner, E. Platzgummer, R. Morgan, S. Manakli, J. Kretz, C. Holhe, K.-H. Choi, F. Thrum, E. Kassel, W. Pilz, K. Keil, J. Butschke, M. Irmscher, F. Letzkus, P. Hudek, A. Paraskevopoulos, P. Ramm, J. Weber
Proceedings Volume 6921, 69211S (2008) https://doi.org/10.1117/12.772472
KEYWORDS: Semiconducting wafers, Lithography, Photomasks, Manufacturing, Electron beams, Electron beam lithography, Nanofabrication, Computed tomography, Prototyping, Maskless lithography

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 651831 (2007) https://doi.org/10.1117/12.711754
KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Scanners, Immersion lithography, Statistical modeling, Optical lithography, Data modeling, Optical alignment, Reticles

Proceedings Article | 24 March 2006 Paper
Pier Luigi Rigolli, Laura Rozzoni, Catia Turco, Umberto Iessi, Marco Polli, Elyakim Kassel, Pavel Izikson, Yosef Avrahamov
Proceedings Volume 6152, 61524C (2006) https://doi.org/10.1117/12.656485
KEYWORDS: Overlay metrology, Metrology, Image segmentation, Front end of line, Semiconducting wafers, Chemical mechanical planarization, Metals, Lithography, Scanning electron microscopy, Scanners

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 615213 (2006) https://doi.org/10.1117/12.656467
KEYWORDS: Reticles, Overlay metrology, Scanners, Data modeling, Semiconducting wafers, Metrology, Chemical mechanical planarization, Manufacturing, Polishing, Optical alignment

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599397
KEYWORDS: Reticles, Overlay metrology, Semiconducting wafers, Scanners, Dysprosium, Metrology, Data modeling, Personal protective equipment, Lithography, Manufacturing

Showing 5 of 12 publications
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