Dr. Elyakim Kassel
at KLA Israel
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 28 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Manufacturing, Photomasks, Computed tomography, Maskless lithography, Semiconducting wafers, Nanofabrication, Prototyping

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Optical lithography, Data modeling, Scanners, Immersion lithography, Optical alignment, Semiconducting wafers, Statistical modeling, Overlay metrology

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Reticles, Polishing, Metrology, Data modeling, Scanners, Manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Metals, Image segmentation, Scanners, Scanning electron microscopy, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization, Front end of line

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Reticles, Metrology, Detection and tracking algorithms, Etching, Scanners, Error analysis, Inspection, Scanning electron microscopy, Semiconducting wafers, Overlay metrology

Showing 5 of 12 publications
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