Dr. Emanuele Baracchi
Mask Technology Manager at STMicrolectronics
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 16 August 2002
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Metrology, Cadmium, Inspection, Control systems, Wafer inspection, Photomasks, Critical dimension metrology, Quality systems, Semiconducting wafers

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Cadmium, Databases, Reliability, Inspection, Control systems, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 9 April 2001
Proc. SPIE. 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithographic illumination, Databases, Inspection, Wafer inspection, Photomasks, Computed tomography, Optical proximity correction, Data conversion, Semiconducting wafers, Defect inspection

Proceedings Article | 19 July 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Data storage, Databases, Image processing, Manufacturing, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 30 December 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Databases, Image processing, Inspection, Printing, Image quality, Software development, Photomasks, Optical proximity correction

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top