Dr. Emek Yesilada
RET R&D Manager at STMicroelectronics
SPIE Involvement:
Author
Area of Expertise:
RET
Publications (38)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Photonic devices, Optical lithography, Waveguides, Etching, Manufacturing, Photomasks, Photonic integrated circuits, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

SPIE Journal Paper | April 27, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Calibration, Optical proximity correction, Critical dimension metrology, Electroluminescence, Wafer-level optics, Semiconducting wafers, Data modeling, 3D modeling, Scanning electron microscopy

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Wafer-level optics, Neck, Data modeling, Calibration, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Lithography, Optical lithography, Liquid phase epitaxy, Visualization, Manufacturing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

SPIE Journal Paper | April 10, 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Optical lithography, Statistical analysis, Metals, Manufacturing, Diagnostics, Wafer inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Design for manufacturability

Showing 5 of 38 publications
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