Emil C. Piscani
Sr Microfabrication Engineer at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Refractive index, Nanoparticles, Water, Ultraviolet radiation, Photoresist materials, Immersion lithography, Nanocomposites, Semiconducting wafers, Absorption

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: FT-IR spectroscopy, Optical lithography, Polymethylmethacrylate, Polymers, Photons, Ionizing radiation, Absorbance, Immersion lithography, Semiconducting wafers, Polymer thin films

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Polymethylmethacrylate, Polymers, Spectroscopy, Photons, Molecules, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Refractive index, Prisms, Nanoparticles, Water, Crystals, Absorbance, Double patterning technology, Immersion lithography, Absorption

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Carbon, Lithography, Diffraction, Optical lithography, Etching, Ultraviolet radiation, Silicon, Reflectivity, Photoresist materials, Silicon carbide

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Refractive index, Nanoparticles, Polymers, Sulfur, Chemistry, Absorbance, Immersion lithography, Line edge roughness, Chlorine

Showing 5 of 18 publications
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