Emile Sahouria
Engineer at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (33)

Proceedings Article | 17 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Manufacturing, Inspection, Data processing, Photomasks, Optical proximity correction, Forward error correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Data modeling, Manufacturing, Inspection, Photomasks, Optical proximity correction, Optical alignment, Forward error correction, Semiconducting wafers, Model-based design

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Wafer-level optics, Lithography, Photovoltaics, Manufacturing, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics), Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Detection and tracking algorithms, Etching, Metals, Image processing, Manufacturing, Computer simulations, Image quality, Photomasks

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Visualization, Metals, Manufacturing, Computer simulations, Photomasks, Image enhancement, Beam shaping, Source mask optimization, Optical proximity correction, Mask making

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Metrology, Manufacturing, Inspection, Computer simulations, Data processing, Photomasks, Data conversion, Semiconducting wafers, Standards development, Vestigial sideband modulation

Showing 5 of 33 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top