Emilien Robert
PhD Student at STMicroelectronics
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Quartz, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Reticles, Quartz, Image processing, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Diffraction, Scattering, Etching, Scanners, Chromium, Photomasks, Optical proximity correction, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Polarization, Monte Carlo methods, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Critical dimension metrology

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