Dr. Emily E. Gallagher
Principal Member of Technical Staff at imec
SPIE Involvement:
Nominating and Leadership Development Committee | Conference Program Committee | Track Chair | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author | Editor
Publications (95)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3012691
KEYWORDS: Sustainability, Etching, Semiconductor manufacturing, Chemical mechanical planarization, Carbon, Atomic layer deposition, Nanostructures, Deposition processes, Very large scale integration, Vacuum

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12956, PC1295601 (2024) https://doi.org/10.1117/12.3013557
KEYWORDS: Sustainability, Semiconductor manufacturing, Lithography, Optical lithography, Semiconducting wafers, Data modeling, Semiconductors, Pollution control, Modeling, Logic

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530M (2024) https://doi.org/10.1117/12.3010378
KEYWORDS: Pellicles, Extreme ultraviolet lithography, Scanners, Permeability, Extreme ultraviolet, Plasma, Materials properties, Resistance, Hydrogen, Fabrication

Proceedings Article | 10 April 2024 Presentation + Paper
Jiahui Wang, Emily Gallagher, Darko Trivkovic, Rik Jonckheere, Jeroen Van de Kerkhove
Proceedings Volume 12953, 129530A (2024) https://doi.org/10.1117/12.3011038
KEYWORDS: Line edge roughness, Semiconducting wafers, Design, Tunable filters, Light sources and illumination, Extreme ultraviolet lithography, Scanning electron microscopy, Scanners, Optical filters, Image analysis

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12499, 124990F (2023) https://doi.org/10.1117/12.2662857
KEYWORDS: Etching, Carbon, Hydrogen, Lithography, Scanners, Semiconductors, Sustainability

Showing 5 of 95 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 21 November 2018

SPIE Conference Volume | 5 December 2017

Conference Committee Involvement (30)
Photomask Technology 2024
29 September 2024 | Monterey, California, United States
Photomask Technology 2023
2 October 2023 | Monterey, California, United States
Photomask Technology 2022
26 September 2022 | Monterey, California, United States
Photomask Technology
27 September 2021 | Online Only, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Showing 5 of 30 Conference Committees
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