Dr. Emily E. Gallagher
Principal Member of Technical Staff at imec
SPIE Involvement:
Conference Program Committee | Track Chair | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author | Editor
Publications (75)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Scattering, Scanners, Particles, Light scattering, Coating, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Atmospheric particles

Proceedings Article | 17 October 2019 Presentation
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Scanners, Particles, Pellicles, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Tolerancing

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Logic, Manufacturing, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Multilayers, Optical lithography, Data modeling, Atomic force microscopy, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Showing 5 of 75 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 21 November 2018

SPIE Conference Volume | 5 December 2017

Conference Committee Involvement (26)
Extreme Ultraviolet (EUV) Lithography XII
21 February 2021 | San Jose, California, United States
Photomask Technology
21 September 2020 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Photomask Technology
16 September 2019 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Showing 5 of 26 Conference Committees
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