Dr. Emily E. Gallagher
Principal Engineer at IMEC
SPIE Involvement:
Fellow status | Senior status | Conference Program Committee | Conference Chair | Author | Editor
Publications (71)

SPIE Journal Paper | November 27, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Carbon nanotubes, Coating, Scanners, Hydrogen, Inspection, Photomasks

SPIE Conference Volume | November 21, 2018

PROCEEDINGS ARTICLE | October 18, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Liquid phase epitaxy, Error analysis, Inspection, Photomasks, Extreme ultraviolet, Cadmium sulfide, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Diffraction, Reticles, Scattering, Coating, Inspection, Pellicles, Image quality, Extreme ultraviolet

PROCEEDINGS ARTICLE | April 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scattering, Scanners, Particles, Silicon, Hydrogen, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Conference Volume | December 5, 2017

Showing 5 of 71 publications
Conference Committee Involvement (23)
Photomask Technology
15 September 2019 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Showing 5 of 23 published special sections
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