Dr. Emily Y. Shu
Patent Agent at Haynes and Boone LLP
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 29 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Multilayers, Metrology, Etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Defect inspection

Proceedings Article | 11 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Reticles, Ultraviolet radiation, Particles, Dielectrics, Interferometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Surface finishing

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Optical lithography, Etching, Image processing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Defect inspection

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Multilayers, Glasses, Particles, Silicon, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Contamination, Deep ultraviolet, Inspection, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Defect inspection

Showing 5 of 13 publications
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