Dr. Emmanuel Dupuy
at CEA-LETI
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Etching, Silicon, Oxygen, Line width roughness, Plasma etching, Critical dimension metrology, Line edge roughness, Neodymium, Photoresist processing, Plasma

PROCEEDINGS ARTICLE | May 28, 2013
Proc. SPIE. 8749, Quantum Information and Computation XI
KEYWORDS: Semiconductors, Mirrors, Surface plasmons, Gaussian beams, Metals, Interfaces, Quantum efficiency, Quantum information, Photonic nanostructures, Nanowires

PROCEEDINGS ARTICLE | March 14, 2013
Proc. SPIE. 8619, Physics and Simulation of Optoelectronic Devices XXI
KEYWORDS: Semiconductors, Mirrors, Surface plasmons, Gaussian beams, Interfaces, Gallium arsenide, Quantum efficiency, Quantum dots, Photonic nanostructures, Nanowires

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