Emmanuelle Luce
at STMicroelectronics
SPIE Involvement:
Publications (4)

Proceedings Article | 16 June 2003 Paper
Laurent Pain, Murielle Charpin, Yves Laplanche, David Herisson, J. Todeschini, Ramiro Palla, A. Beverina, H. Leininger, S. Tourniol, M. Broekaart, Emmanuelle Luce, F. Judong, K. Brosselin, Y. Le Friec, F. Leverd, S. Del Medico, V. De Jonghe, Daniel Henry, M. Woo, F. Arnaud
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482336
KEYWORDS: Etching, Electron beam lithography, Lithography, Semiconducting wafers, Optical alignment, Photomasks, Chemistry, Scanners, Oxides, CMOS technology

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474634
KEYWORDS: Critical dimension metrology, Modeling, Optical lithography, Electroluminescence, Semiconducting wafers, Scanners, Reticles, Optical proximity correction, Tolerancing, Photoresist processing

Proceedings Article | 5 July 2000 Paper
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389084
KEYWORDS: Semiconducting wafers, Scanners, Photoresist processing, Light scattering, Stray light, Bottom antireflective coatings, Critical dimension metrology, Deep ultraviolet, Silicon, Microelectronics

Proceedings Article | 26 July 1999 Paper
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354349
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Photomasks, Scanners, Reflectivity, Reflection, Optical lithography, Scanning electron microscopy, Error analysis

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