Emmanuelle Luce
at STMicroelectronics
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 16 June 2003 Paper
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Oxides, Lithography, Electron beam lithography, Etching, Scanners, Chemistry, Photomasks, CMOS technology, Optical alignment, Semiconducting wafers

Proceedings Article | 30 July 2002 Paper
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Modeling, Reticles, Optical lithography, Scanners, Electroluminescence, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Tolerancing

Proceedings Article | 5 July 2000 Paper
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Deep ultraviolet, Scanners, Silicon, Light scattering, Microelectronics, Critical dimension metrology, Stray light, Photoresist processing, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 26 July 1999 Paper
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Reticles, Optical lithography, Reflection, Scanners, Error analysis, Reflectivity, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

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