En Chuan Lio
Manager at United Microelectronics Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Double patterning technology, Critical dimension metrology, Molybdenum, Semiconducting wafers, Overlay metrology, Information operations

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Roads, Data modeling, Calibration, Distortion, Optical alignment, Neodymium, Semiconducting wafers, HVAC controls, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Mathematical modeling, Stars, Data modeling, Scanners, Solids

PROCEEDINGS ARTICLE | October 3, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Modulation, Silicon, Photoresist materials, Finite element methods, Photomasks, Integrated optics, Molybdenum, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Target detection, Etching, Control systems, Time metrology, Process control, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Imaging metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Image processing, Scanning electron microscopy, Signal processing, Photoresist processing, Semiconducting wafers, Overlay metrology

Showing 5 of 6 publications
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