Dr. David Liu
Project Manager at INKO Industrial Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Electron beam lithography, Point spread functions, Electron beams, Polymethylmethacrylate, Scattering, Silicon, Monte Carlo methods, Image quality, Software development, Critical dimension metrology

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Defect detection, Sensors, Data storage, Scanners, Inspection, Magnetism, Scanning electron microscopy, Wafer inspection, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Optical lithography, Polymethylmethacrylate, Etching, Scanners, Beam shaping, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Chromatic aberrations, Electron beam lithography, Diffraction, Monochromatic aberrations, Electron beams, Electrodes, Image resolution, Colorimetry, Semiconducting wafers, Beam analyzers

PROCEEDINGS ARTICLE | April 4, 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Logic, Optical lithography, Metals, Photomasks, Optical alignment, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | April 4, 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Chromatic aberrations, Electron beam lithography, Electron beams, Scattering, Laser scattering, Monte Carlo methods, Thermal effects, Electron beam direct write lithography, Spherical lenses, Semiconducting wafers

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top