Dr. Engelbert Mittermeier
at Qimonda AG
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Mathematical modeling, Modeling, Electron beam lithography, Electron beams, Data modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Statistical modeling, Process modeling

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Metrology, Etching, Image processing, Manufacturing, Control systems, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Data modeling, Manufacturing, Photomasks, Optical simulations, SRAF, Semiconducting wafers, Data corrections, Process modeling

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