Enrico Bellmann
at Qoniac GmbH
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Electronics, Data modeling, Computer simulations, Information technology, Optical alignment, Neodymium, Semiconducting wafers, Yield improvement, Overlay metrology, Standards development

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Data modeling, Etching, Distortion, Computer simulations, Deposition processes, Optical alignment, Molybdenum, Semiconducting wafers, Overlay metrology

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Environmental monitoring, Contamination, Databases, Metals, Scanners, Reflectivity, Data processing, High volume manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Data modeling, Image processing, Computer simulations, Process control, High volume manufacturing, Optical alignment, Optimization (mathematics), Semiconducting wafers, Statistical modeling, Performance modeling, Overlay metrology

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Coastal modeling, Data modeling, Zernike polynomials, Process control, Semiconducting wafers, Performance modeling, Overlay metrology, Model-based design, Process modeling

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