Dr. Erez Graitzer
Project Manager and Sales Representative at Carl Zeiss SMS Ltd
SPIE Involvement:
Publications (21)

Proceedings Article | 19 March 2015 Paper
Ofir Sharoni, Vladimir Dmitriev, Erez Graitzer, Yuval Perets, Kujan Gorhad, Richard van Haren, Hakki Cekli, Jan Mulkens
Proceedings Volume 9424, 94241K (2015) https://doi.org/10.1117/12.2085651
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Image registration, Reticles, Overlay metrology, Lithium, Distortion, Metrology, Actuators

Proceedings Article | 2 April 2014 Paper
Proceedings Volume 9050, 905015 (2014) https://doi.org/10.1117/12.2048081
KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Overlay metrology, Process control, Optical lithography, Silica, Data modeling, Reticles, Data acquisition

Proceedings Article | 9 September 2013 Paper
Avi Cohen, Thomas Trautzsch, Ute Buttgereit, Erez Graitzer, Ori Hanuka
Proceedings Volume 8880, 888025 (2013) https://doi.org/10.1117/12.2027348
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Photomasks, Logic, Signal attenuation, Metrology, Neodymium, Polonium, Finite element methods, Control systems

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85220D (2012) https://doi.org/10.1117/12.980258
KEYWORDS: Photomasks, Image registration, Scanners, Semiconducting wafers, Manufacturing, Overlay metrology, Metrology, Silica, Double patterning technology, Algorithm development

Proceedings Article | 30 June 2012 Paper
Erez Graitzer, Avi Cohen, Vladimir Dmitriev, Itamar Balla, Dan Avizemer, Dirk Beyer, Klaus Boehm, Wolfgang Degel
Proceedings Volume 8441, 84410A (2012) https://doi.org/10.1117/12.976632
KEYWORDS: Photomasks, Image registration, Semiconducting wafers, Overlay metrology, Pellicles, Metrology, Process control, Error analysis, Manufacturing, Scanners

Showing 5 of 21 publications
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