Dr. Erez Graitzer
Project Manager and Sales Representative at Carl Zeiss SMS Ltd
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Image registration, Reticles, Overlay metrology, Lithium, Distortion, Metrology, Actuators

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Overlay metrology, Process control, Optical lithography, Silica, Data modeling, Reticles, Data acquisition

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Photomasks, Logic, Signal attenuation, Metrology, Neodymium, Polonium, Finite element methods, Control systems

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Photomasks, Image registration, Scanners, Semiconducting wafers, Manufacturing, Overlay metrology, Metrology, Silica, Double patterning technology, Algorithm development

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Photomasks, Image registration, Semiconducting wafers, Overlay metrology, Pellicles, Metrology, Process control, Error analysis, Manufacturing, Scanners

Proceedings Article | 16 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Photomasks, Image registration, Scanners, Manufacturing, Semiconducting wafers, Silica, Overlay metrology, Double patterning technology, Metrology, Algorithm development

Showing 5 of 21 publications
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