Dr. Erez Graitzer
Project Manager and Sales Representative at Carl Zeiss SMS Ltd
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Actuators, Reticles, Metrology, Lithium, Scanners, Distortion, Image registration, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Data modeling, Silica, Scanners, Data acquisition, Process control, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Metrology, Logic, Signal attenuation, Control systems, Finite element methods, Photomasks, Critical dimension metrology, Neodymium, Semiconducting wafers, Polonium

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Metrology, Silica, Scanners, Manufacturing, Image registration, Photomasks, Double patterning technology, Algorithm development, Semiconducting wafers, Overlay metrology

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Metrology, Scanners, Error analysis, Manufacturing, Image registration, Pellicles, Process control, Photomasks, Semiconducting wafers, Overlay metrology

Showing 5 of 21 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top