Eric L. Alemy
Product Specialist at EMD Performance Materials Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Oxides, Electron beams, FT-IR spectroscopy, Etching, Polymers, Chemistry, Surface roughness, Scanning electron microscopy, Photoresist processing, Semiconducting wafers

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Lithographic illumination, Etching, Polymers, Fourier transforms, Photomasks, Line edge roughness, Photoresist processing, Semiconducting wafers, Binary data

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Monochromatic aberrations, Coherence (optics), Polymers, Diffusion, Scanning electron microscopy, Photomasks, Halftones, Photoresist processing, Binary data

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