Eric Beisser
CEO at XYALIS
SPIE Involvement:
Author
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Publications (5)

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Databases, Image processing, Control systems, Image registration, Photomasks, Neodymium, Overlay metrology

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Switches, Switching, Databases, Metals, Power supplies, Transistors, Computer aided design, Resistors, Algorithm development, Electronic design automation

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Mirrors, Multilayers, Clocks, Capacitors, Databases, Metals, Silicon, Transistors, Computer aided design, Analog electronics

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Reticles, Optical lithography, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Yield improvement, Lead, Instrument modeling, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Databases, Silicon, Manufacturing, Inspection, Design for manufacturing, Photomasks, Computer aided design, Electronic design automation, Design for manufacturability

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