Eric Bouche
General Manager at Ultratech Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Oxides, Lithography, Metrology, Data modeling, Manufacturing, Inspection, Interferometry, Distortion, Process control, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Data modeling, Scanners, Interferometry, Distortion, Process control, High volume manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Interferometers, Image processing, Scanners, Manufacturing, Inspection, Interferometry, Control systems, Process control, Semiconducting wafers, Overlay metrology, Defect inspection

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