Dr. Eric Cotte
Research & Development Engineer at GLOBALFOUNDRIES Dresden Module Two GmbH & Co KG
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Optical filters, Metrology, Data modeling, Optical properties, Etching, Image segmentation, Signal processing, Optical simulations, Semiconducting wafers, Overlay metrology

Proceedings Article | 17 October 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Etching, Control systems, Distortion, Photomasks, Plasma etching, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 1 October 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Scanners, Manufacturing, Time metrology, Pollution control, Process control, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Reticles, Image processing, Scanners, Manufacturing, Thermal effects, Process control, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Signal to noise ratio, Lithography, Principal component analysis, Error analysis, Image registration, Process control, Photomasks, Electron beam melting, Critical dimension metrology, Tolerancing

Showing 5 of 30 publications
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