Eric L. Fanucchi
Photomask Engineering Manager at Photo Image Creations
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Optical lithography, Metals, Manufacturing, Inspection, Printing, Photomasks, Nanoimprint lithography, Critical dimension metrology, 193nm lithography

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Reticles, Optical lithography, Lithographic illumination, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Binary data, 193nm lithography

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Optical design, Reticles, Logic, Optical lithography, Lithographic illumination, Scanners, Optical proximity correction, SRAF, 193nm lithography

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Multilayers, Reticles, Etching, Manufacturing, Inspection, Process control, Transmittance, Photomasks, Tin

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