Dr. Eric Hendrickx
PhD at IMEC
SPIE Involvement:
Conference Program Committee | Conference Chair | Author
Publications (92)

PROCEEDINGS ARTICLE | March 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Etching, Metals, Copper, Resistance, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Tin

PROCEEDINGS ARTICLE | March 21, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Extreme ultraviolet, SRAF, Photoresist processing, Stochastic processes, Tin

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Cadmium, Etching, Inspection, Scanning electron microscopy, Printing, Photomasks, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Thin films, Lithography, Refractive index, Nickel, Reflectivity, Photomasks, Extreme ultraviolet, Ruthenium, Phase shifts

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Image processing, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Optical proximity correction

Showing 5 of 92 publications
Conference Committee Involvement (5)
Extreme Ultraviolet (EUV) Lithography X
24 February 2019 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2018
17 September 2018 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography
11 September 2017 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
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