Eric Janda
at
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Distortion, Measurement devices, Photomasks, Overlay metrology, Instrument modeling

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Diffraction, Metrology, Data modeling, Inspection, Computer simulations, Printing, Semiconducting wafers, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Scanners, Optical simulations, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Performance modeling

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Reticles, Metrology, Cadmium, Data modeling, Calibration, Scanners, Scanning electron microscopy, Printing, Scatterometry, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top