Eric Janda
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Metrology, Logic, Deep ultraviolet, Scanners, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Distortion, Measurement devices, Photomasks, Overlay metrology, Instrument modeling

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Diffraction, Metrology, Data modeling, Inspection, Computer simulations, Printing, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Scanners, Optical simulations, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Performance modeling

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Reticles, Metrology, Cadmium, Data modeling, Calibration, Scanners, Scanning electron microscopy, Printing, Scatterometry, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top