Dr. Eric Logean
Optical System Engineer at Safran Vectronix AG
SPIE Involvement:
Author
Area of Expertise:
Optical system design , adaptive optics , physiological optics , micro-optics , synthetic holography , laser Doppler velocimetry
Websites:
Profile Summary

Eric Logean received his diploma in Electrical Engineering from the Technical Institute of Sion, Switzerland, in 1993 (HES-SO). From 1995 to 2004, he was an engineer with the Optics and Biophysics Laboratory at the Institute of Research in Ophthalmology in Sion, Switzerland, developing laser Doppler instruments for retinal blood flow measurements. In 1997, he was visiting the Applied Optics Group at the University of Tsukuba, Japan, where he designed and fabricated synthetic holograms. In 2004, he became a graduate research assistant with the Applied Optics Group at the National University of Ireland in Galway from where he received his PhD degree in Physics in 2009 for his work on retinal imaging using adaptive optics. Since then, he is a scientist at the Ecole Polytechnique Fédérale de Lausanne working in micro-optics design.
Publications (4)

SPIE Journal Paper | January 31, 2014
OE Vol. 53 Issue 06
KEYWORDS: Colorimetry, Blood circulation, Optic nerve, Head, Doppler effect, Eye, Modulation, Mercury, Cameras, Optical engineering

SPIE Journal Paper | July 1, 2013
OE Vol. 52 Issue 07
KEYWORDS: Monochromatic aberrations, Objectives, Image sensors, Image quality, Sensors, Semiconducting wafers, Modulation transfer functions, Satellites, Wafer-level optics, Miniature imaging systems

PROCEEDINGS ARTICLE | March 7, 2013
Proc. SPIE. 8667, Multimedia Content and Mobile Devices
KEYWORDS: Monochromatic aberrations, Imaging systems, Sensors, Satellites, Satellite imaging, Image sensors, Objectives, Modulation transfer functions, Semiconducting wafers, Electroluminescent displays

PROCEEDINGS ARTICLE | December 18, 2012
Proc. SPIE. 8550, Optical Systems Design 2012
KEYWORDS: Mid-IR, Etching, Silicon, Manufacturing, Quantum cascade lasers, Micro optics, Aspheric lenses, Reactive ion etching, Photoresist processing, Semiconducting wafers

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