Eric Long Ma
Sr. Manager at Hermes-Microvision Inc USA
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Semiconductors, Defect detection, Inspection, Computing systems, Optical inspection, Image quality, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Semiconducting wafers

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Defect detection, Inspection, Computing systems, Scanning electron microscopy, Wafer inspection, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Electron beams, Metrology, Logic, Scanners, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Image processing, Inspection, Computing systems, Scanning electron microscopy, Image quality, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Defect detection, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

Proceedings Article | 28 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Etching, Inspection, Electron microscopes, Scanning electron microscopy, Data acquisition, Field effect transistors, Critical dimension metrology, Semiconducting wafers, Defect inspection

Showing 5 of 14 publications
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