Eric R. Poortinga
Product Manager and Sales Representative at
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Publications (13)

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Image processing, Error analysis, Manufacturing, Image analysis, Photomasks, Analytical research, Critical dimension metrology, Semiconducting wafers, Tolerancing, Standards development

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Metrology, Error analysis, Manufacturing, Image analysis, Photomasks, Analytical research, Critical dimension metrology, Semiconducting wafers, Standards development

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Data modeling, Visualization, Databases, Interfaces, Manufacturing, Computer programming, Photomasks, Optical proximity correction, Manufacturing equipment

Proceedings Article | 25 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Metrology, Visualization, Image processing, Interfaces, Scanning electron microscopy, Design for manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Scanners, Manufacturing, Image acquisition, Data acquisition, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Metrology, Scanners, Manufacturing, Image acquisition, Data acquisition, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Showing 5 of 13 publications
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