Erik R. Byers
Sr. Engineer at Micron Technology Inc
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Wafer-level optics, Metrology, Optical lithography, Diffractive optical elements, Cadmium, Databases, Scanners, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Calibration, Scanners, Computer simulations, Finite element methods, Computational lithography, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Thermal modeling

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Scanners, Optical simulations, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Performance modeling

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Lithography, Metrology, Imaging systems, Scanners, Inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Yield improvement

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Reticles, Metrology, Cadmium, Data modeling, Calibration, Scanners, Scanning electron microscopy, Printing, Scatterometry, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Reticles, Optical lithography, Polymers, Molecules, Diffusion, Photoresist materials, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

Showing 5 of 8 publications
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