Dr. Erik R. Hosler
Lead EUV Technologist at
SPIE Involvement:
Conference Program Committee | Author
Publications (16)

SPIE Journal Paper | October 30, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Free electron lasers, Extreme ultraviolet lithography, Electron beams, Extreme ultraviolet, Electrons, Lithography, Monochromators, Light sources, Scanners, Optical resonators

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, High volume manufacturing, EUV optics

PROCEEDINGS ARTICLE | March 31, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Light sources, Imaging systems, Scanners, Electrons, Manufacturing, Laser applications, Amplifiers, Optical resonators, Extreme ultraviolet, Extreme ultraviolet lithography, Monochromators, Semiconducting wafers, Free electron lasers, Plasma

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Metrology, Imaging systems, Scanners, Error analysis, Control systems, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Systems modeling, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Ions, Chemistry, Extreme ultraviolet, Line edge roughness, Back end of line, Front end of line

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Monte Carlo methods, Photomasks, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Critical dimension metrology, EUV optics, Personal protective equipment

Showing 5 of 16 publications
Conference Committee Involvement (2)
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
24 February 2019 | San Jose, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
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