Dr. Erin L. Jablonski
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Carbon, Thin films, Sensors, Polymers, Ultraviolet radiation, Chemistry, Photoresist materials, Semiconducting wafers, Polymer thin films, Protactinium

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Scattering, Polymers, X-rays, Reflectivity, Surface roughness, Atomic force microscopy, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Carbon, Thin films, Sensors, Polymers, Molecules, X-rays, Silicon, Chemistry, Chlorine, Liquids

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