Prof. Ernst-Bernhard Kley Profile

Prof. Ernst-Bernhard Kley

Workpackage Leader at Friedrich-Schiller-Univ Jena

SPIE Involvement:

Conference Program Committee | Conference Chair | Author

Publications (119)

PROCEEDINGS ARTICLE | November 20, 2017

Development of a large blazed transmission grating by effective binary index modulation for the GAIA radial velocity spectrometer

Proc. SPIE. 10565, International Conference on Space Optics — ICSO 2010

KEYWORDS: Diffraction, Modulation, Silica, Etching, Spectroscopy, Chromium, Charge-coupled devices, Stray light, Binary data, Diffraction gratings

Read Abstract +

DOWNLOAD PDF

PROCEEDINGS ARTICLE | October 31, 2016

Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

Proc. SPIE. 10022, Holography, Diffractive Optics, and Applications VII

KEYWORDS: Lithography, Electron beam lithography, Diffraction, Optical design, Electron beams, Silica, X-rays, Photoresist materials, Photomasks, X-ray lithography

Read Abstract +

PROCEEDINGS ARTICLE | October 31, 2016

Anti-reflective sub-wavelength structures at a wavelength of 441.6 nm for phase masks of near-field lithography

Proc. SPIE. 10022, Holography, Diffractive Optics, and Applications VII

KEYWORDS: Lithography, Electron beam lithography, Diffraction, Antireflective coatings, Glasses, Interfaces, Reflectivity, Near field, Photomasks, Stray light

Read Abstract +

PROCEEDINGS ARTICLE | September 15, 2016

Design and fabrication of titanium dioxide wire grid polarizer for the far ultraviolet spectral range

Proc. SPIE. 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII

KEYWORDS: Electron beam lithography, Diffraction, Refractive index, Titanium, Titanium dioxide, Polarization, Polarizers, Transmittance, Photomasks, Far ultraviolet

Read Abstract +

PROCEEDINGS ARTICLE | September 15, 2016

Self-organized, effective medium black silicon antireflection structures for silicon optics in the mid-infrared

Proc. SPIE. 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII

KEYWORDS: Mid-IR, Antireflective coatings, Scattering, Etching, Interfaces, Silicon, Coating, Transmittance, Reactive ion etching, Optics manufacturing

Read Abstract +

PROCEEDINGS ARTICLE | March 15, 2016

Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)

Proc. SPIE. 9780, Optical Microlithography XXIX

KEYWORDS: Optical components, Lithography, Electron beam lithography, Optical lithography, Polymers, Metals, Coating, Scanning electron microscopy, Photoresist materials, Photomasks, Aluminum, Double patterning technology, Nanolithography, Diffraction gratings

Read Abstract +

SPIE Journal Paper | February 3, 2016

Broadband and wide-angle hybrid antireflection coatings prepared by combining interference multilayers with subwavelength structures

Stéphane Bruynooghe, Marcel Schulze, Michael Helgert, Michel Challier, Diana Tonova, Michael Sundermann, Thomas Koch, Alexandre Gatto, Ernst-Bernhard Kley

JNP Vol. 10 Issue 03

KEYWORDS: Antireflective coatings, Reflectivity, Refractive index, Glasses, Coating, Multilayers, Thin films, Reflection, Nanostructures, Etching

Read Abstract +

PROCEEDINGS ARTICLE | September 23, 2015

Composite materials and nanoporous thin layers made by atomic layer deposition

Proc. SPIE. 9627, Optical Systems Design 2015: Advances in Optical Thin Films V

KEYWORDS: Oxides, Refractive index, Silica, Etching, Molecules, Composites, Diffusion, Spectroscopic ellipsometry, Atomic layer deposition, Aluminum

Read Abstract +

PROCEEDINGS ARTICLE | September 23, 2015

High-efficiency embedded transmission grating

Proc. SPIE. 9627, Optical Systems Design 2015: Advances in Optical Thin Films V

KEYWORDS: Diffraction, Refractive index, Titanium dioxide, Silica, Etching, Coating, Oxygen, Ion beams, Atomic layer deposition, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | August 20, 2015

Wideband antireflection coatings combining interference multilayers and subwavelength structures prepared by reactive ion etching

Proc. SPIE. 9558, Nanostructured Thin Films VIII

KEYWORDS: Thin films, Nanostructures, Refractive index, Antireflective coatings, Multilayers, Silica, Reflection, Etching, Coating, Reflectivity

Read Abstract +

PROCEEDINGS ARTICLE | March 18, 2015

Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography

Proc. SPIE. 9426, Optical Microlithography XXVIII

KEYWORDS: Lithography, Lithographic illumination, Silica, Etching, Chromium, Polarizers, Ion beams, Photomasks, Reactive ion etching, Photomicroscopy

Read Abstract +

PROCEEDINGS ARTICLE | February 27, 2015

Bringing mirrors to rest: grating concepts for ultra-precise interferometry

Proc. SPIE. 9372, High Contrast Metastructures IV

KEYWORDS: Reflectors, Diffraction, Mirrors, Metrology, Modulation, Interferometers, Silicon, Reflectivity, Transmittance, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | October 17, 2014

Multi-stencil character projection e-beam lithography: a fast and flexible way for high quality optical metamaterials

Proc. SPIE. 9231, 30th European Mask and Lithography Conference

KEYWORDS: Gold, Metamaterials, Electron beam lithography, Scanning electron microscopy, Terahertz radiation, Nanomaterials, Beam shaping, Nanolithography, Vestigial sideband modulation, Optical metamaterials

Read Abstract +

PROCEEDINGS ARTICLE | March 27, 2014

Chiral nanomaterial fabrication by means of on-edge lithography

Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI

KEYWORDS: Gold, Lithography, Nanostructures, Electron beam lithography, Metals, Particles, Terahertz radiation, Nanomaterials, Dichroic materials, Nanolithography

Read Abstract +

PROCEEDINGS ARTICLE | March 7, 2014

Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection

Proc. SPIE. 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII

KEYWORDS: Fabrication, Metamaterials, Lithography, Plasmonics, Electron beam lithography, Electron beams, Gaussian beams, Beam shaping, Nanolithography, Vestigial sideband modulation

Read Abstract +

PROCEEDINGS ARTICLE | February 19, 2014

Investigation on the angular dependent reflectance of coupled high-contrast gratings

Proc. SPIE. 8995, High Contrast Metastructures III

KEYWORDS: Optical components, Reflectors, Refractive index, Fabry–Perot interferometers, Resonators, Silica, Silicon, Reflectivity, Tolerancing, Light wave propagation

Read Abstract +

PROCEEDINGS ARTICLE | February 19, 2014

High-refractive-index gratings for spectroscopic and laser applications

Proc. SPIE. 8995, High Contrast Metastructures III

KEYWORDS: Lithography, Electron beam lithography, Diffraction, Refractive index, Optical design, Titanium dioxide, Silica, Etching, Atomic layer deposition, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | March 15, 2013

The underlying structure of ultrashort pulse laser-induced nanogratings

Proc. SPIE. 8611, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XIII

KEYWORDS: Ultrafast phenomena, Scattering, Etching, Particles, X-rays, Light scattering, Laser scattering, Scanning electron microscopy, Ion beams, Pulsed laser operation

Read Abstract +

PROCEEDINGS ARTICLE | March 15, 2013

Asymmetric direction selective filter elements based on high-contrast gratings

Proc. SPIE. 8633, High Contrast Metastructures II

KEYWORDS: Semiconductors, Diffraction, Optical filters, Refractive index, Optical design, Silica, Silicon, Picosecond phenomena, Binary data, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | March 15, 2013

High contrast gratings for high-precision metrology

Proc. SPIE. 8633, High Contrast Metastructures II

KEYWORDS: Optical components, Mirrors, Beam splitters, Metrology, Crystals, Silicon, Light scattering, Optical coatings, Reflectivity, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | September 17, 2012

Resolution limits of transmission optics for x-ray astronomy

Proc. SPIE. 8443, Space Telescopes and Instrumentation 2012: Ultraviolet to Gamma Ray

KEYWORDS: Point spread functions, Mirrors, X-ray optics, Lenses, Image segmentation, X-rays, Spatial resolution, Zone plates, Fresnel lenses, X-ray astronomy

Read Abstract +

PROCEEDINGS ARTICLE | September 13, 2012

High-performance dielectric diffraction gratings for space applications

Proc. SPIE. 8450, Modern Technologies in Space- and Ground-based Telescopes and Instrumentation II

KEYWORDS: Lithography, Electron beam lithography, Diffraction, Optical design, Electron beams, Spectroscopy, Dielectrics, Laser applications, Dielectric polarization, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | May 2, 2012

Black silicon for solar cell applications

Proc. SPIE. 8438, Photonics for Solar Energy Systems IV

KEYWORDS: Nanostructures, Antireflective coatings, Etching, Solar cells, Dielectrics, Interfaces, Silicon, Optical coatings, Reflectivity, Absorption

Read Abstract +

PROCEEDINGS ARTICLE | May 2, 2012

Black silicon photovoltaics

Proc. SPIE. 8438, Photonics for Solar Energy Systems IV

KEYWORDS: Oxides, Nanostructuring, Etching, Solar cells, Interfaces, Silicon, Reflectivity, Silicon films, Transparent conductors, Nanolithography

Read Abstract +

PROCEEDINGS ARTICLE | April 17, 2012

Enhanced e-beam pattern writing for nano-optics based on character projection

Proc. SPIE. 8352, 28th European Mask and Lithography Conference

KEYWORDS: Optical components, Lithography, Electron beam lithography, Polarizers, Beam shaping, Applied physics, Chemical elements, Precision optics, Vestigial sideband modulation, Nano optics

Read Abstract +

PROCEEDINGS ARTICLE | February 23, 2012

Tuning the reflectivity of high-contrast gratings based on silicon and silica by means of wet etching with hydrofluoric acid

Proc. SPIE. 8270, High Contrast Metastructures

KEYWORDS: Oxides, Thin films, Silica, Etching, Ions, Silicon, Reflectivity, Wet etching, Tolerancing, HF etching

Read Abstract +

PROCEEDINGS ARTICLE | February 23, 2012

High frequency binary amorphous silicon grating working as wire grid polarizer for UV applications

Proc. SPIE. 8270, High Contrast Metastructures

KEYWORDS: Amorphous silicon, Refractive index, Optical properties, Etching, Ultraviolet radiation, Silicon, Polarizers, Optical testing, Mineralogy, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | February 23, 2012

Diffractive optical elements based on subwavelength high-contrast gratings

Proc. SPIE. 8270, High Contrast Metastructures

KEYWORDS: Optical components, Reflectors, Diffractive optical elements, Modulation, Silica, Polarization, Silicon, Reflectivity, Tolerancing, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | February 16, 2012

Novel direction selective filter elements based on high-contrast gratings

Proc. SPIE. 8270, High Contrast Metastructures

KEYWORDS: Diffraction, Optical filters, Refractive index, Silica, Sensors, Dielectrics, Silicon, Dielectric filters, Diffraction gratings, Absorption

Read Abstract +

PROCEEDINGS ARTICLE | October 4, 2011

Atomic layer deposition of iridium thin films and their application in gold electrodeposition

Proc. SPIE. 8168, Advances in Optical Thin Films IV

KEYWORDS: Gold, Infrared imaging, Thin films, Multilayers, Electrodes, Metals, Coating, Transmission electron microscopy, Atomic layer deposition, Iridium

Read Abstract +

SPIE Journal Paper | June 1, 2011

Efficient extreme ultraviolet transmission gratings for plasma diagnostics

Christoph Braig, Ernst-Bernhard Kley, Peter Predehl

OE Vol. 50 Issue 06

KEYWORDS: Extreme ultraviolet, Diffraction gratings, Diffraction, Plasma diagnostics, Molybdenum, Plasma, Beryllium, Absorption, Optical engineering, X-rays

Read Abstract +

PROCEEDINGS ARTICLE | February 14, 2011

Design and fabrication of a highly off-axis binary multi-phase-level computer-generated hologram based on an effective medium approach

Proc. SPIE. 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV

KEYWORDS: Optical components, Diffraction, Optical design, Silica, Calibration, Etching, Computer generated holography, Reactive ion etching, Binary data, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | July 29, 2010

Efficient EUV transmission gratings for plasma diagnostics

Proc. SPIE. 7732, Space Telescopes and Instrumentation 2010: Ultraviolet to Gamma Ray

KEYWORDS: Diffraction, Polymethylmethacrylate, Spectroscopy, X-rays, Extreme ultraviolet, Molybdenum, Beryllium, Binary data, Plasma, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | May 18, 2010

Nanostructured SIS solar cells

Proc. SPIE. 7725, Photonics for Solar Energy Systems III

KEYWORDS: Oxides, Antireflective coatings, Nanostructuring, Sputter deposition, Electrodes, Solar cells, Silicon, Reflectivity, Transparent conductors, Tin

Read Abstract +

PROCEEDINGS ARTICLE | May 18, 2010

Optical modeling of needle like silicon surfaces produced by an ICP-RIE process

Proc. SPIE. 7725, Photonics for Solar Energy Systems III

KEYWORDS: Reflection, Scattering, Etching, Silicon, Light scattering, Reflectivity, Reactive ion etching, Semiconducting wafers, Surface finishing, Absorption

Read Abstract +

PROCEEDINGS ARTICLE | May 13, 2010

High performance gratings for space applications

Proc. SPIE. 7716, Micro-Optics 2010

KEYWORDS: Lithography, Diffraction, Refractive index, Optical design, Polarization, Spectroscopy, Reactive ion etching, Binary data, Dielectric polarization, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | February 16, 2010

Multi-phase-level diffractive elements realized by binary effective medium patterns

Proc. SPIE. 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III

KEYWORDS: Optical components, Lithography, Diffraction, Electron beams, Reflectivity, Chromium, Computer generated holography, Quantization, Beam shaping, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | February 19, 2009

Wire-grid polarizer for the UV spectral region

Proc. SPIE. 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II

KEYWORDS: Diffraction, Refractive index, Etching, Metals, Ultraviolet radiation, Chromium, Polarizers, Photoresist materials, Aluminum, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | May 14, 2008

Comparison of different simulation methods for multiplane computer generated holograms

Proc. SPIE. 6992, Micro-Optics 2008

KEYWORDS: Signal to noise ratio, Optical components, Refractive index, Beam splitters, Spatial frequencies, Fourier transforms, Computer simulations, Computer generated holography, Wave propagation, Chemical elements

Read Abstract +

PROCEEDINGS ARTICLE | February 25, 2008

Spectral combining of pulsed fiber lasers: scaling considerations

Proc. SPIE. 6873, Fiber Lasers V: Technology, Systems, and Applications

KEYWORDS: Fiber amplifiers, Diffraction, Optical amplifiers, Modulation, Dielectrics, Fiber lasers, Semiconductor lasers, Pulsed fiber lasers, Laser systems engineering, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | February 6, 2008

Highly dispersive dielectric transmission gratings with 100% diffraction efficiency

Proc. SPIE. 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics

KEYWORDS: Diffraction, Optical design, Antireflective coatings, Silica, Reflection, Dielectrics, Interfaces, Coating, Reflectivity, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | February 6, 2008

New approach for antireflective fused silica surfaces by statistical nanostructures

Proc. SPIE. 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics

KEYWORDS: Nanostructures, Antireflective coatings, Silica, Reflection, Etching, Polymers, Ultraviolet radiation, Oxygen, Aluminum, Plasma etching

Read Abstract +

PROCEEDINGS ARTICLE | February 6, 2008

100% reflectivity from a monolithic dielectric microstructured surface

Proc. SPIE. 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics

KEYWORDS: Diffraction, Mirrors, Waveguides, Reflection, Dielectrics, Silicon, Coating, Reflectivity, Tolerancing, Diffraction gratings

Read Abstract +

SPIE Conference Volume | November 14, 2007

3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

PROCEEDINGS ARTICLE | May 22, 2007

Fabrication process of 3D-photonic crystals via UV-nanoimprint lithography

Proc. SPIE. 6591, Nanotechnology III

KEYWORDS: Lithography, Crystals, Silicon, Coating, Photonic crystals, Scanning electron microscopy, Aluminum, Nanoimprint lithography, Optical alignment, Photoresist processing

Read Abstract +

PROCEEDINGS ARTICLE | August 31, 2006

Advanced lithography for micro-optics

Proc. SPIE. 6290, Laser Beam Shaping VII

KEYWORDS: Fabrication, Semiconductors, Optical components, Lithography, Electron beam lithography, Wavefronts, Micro optics, Binary data, Laser systems engineering, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | June 9, 2006

Nonlinear resonance effects on thin micro structured aluminum metal gratings by high power fs-laser pulses

Proc. SPIE. 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

KEYWORDS: Gold, Nanostructures, Diffraction, Silica, Metals, Electrons, Coating, Nonlinear optics, Aluminum, Diffraction gratings

Read Abstract +

SPIE Conference Volume | February 23, 2006

2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

PROCEEDINGS ARTICLE | October 20, 2005

Design and fabrication of refractive and diffractive micro optical elements used in holographic recording setups

Proc. SPIE. 5965, Optical Fabrication, Testing, and Metrology II

KEYWORDS: Optical components, Optical filters, Holograms, Holography, Gaussian beams, Spatial frequencies, Dielectrics, Interference (communication), Beam shaping, Dielectric filters

Read Abstract +

PROCEEDINGS ARTICLE | October 20, 2005

Near-field holography with a two-dimensional phase mask for fabrication of two-dimensional structures in a single exposure step

Proc. SPIE. 5965, Optical Fabrication, Testing, and Metrology II

KEYWORDS: Lithography, Electron beam lithography, Diffraction, Holography, Polarization, Free space, Scanning electron microscopy, Near field, Wave propagation, Photomasks

Read Abstract +

PROCEEDINGS ARTICLE | October 20, 2005

Novel fabrication technique of continuous profiles for microoptics and integrated optics

Proc. SPIE. 5965, Optical Fabrication, Testing, and Metrology II

KEYWORDS: Fabrication, Lithography, Optical lithography, Waveguides, Etching, Dry etching, Coating, Photoresist materials, Photomasks, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | October 20, 2005

Transmission measurements for the optical characterization of 2D-photonic crystals

Proc. SPIE. 5965, Optical Fabrication, Testing, and Metrology II

KEYWORDS: Nanostructuring, Optical properties, Quartz, Crystals, Photonic crystals, Optical testing, Scanning electron microscopy, Spatial resolution, Niobium, Nanolithography

Read Abstract +

PROCEEDINGS ARTICLE | October 15, 2005

High-efficiency transmission gratings for unpolarized illumination: an intelligible analysis of the diffraction process

Proc. SPIE. 5962, Optical Design and Engineering II

KEYWORDS: Diffraction, Optical design, Silica, Waveguides, Polarization, Dielectrics, Wave propagation, Geometrical optics, Light wave propagation, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | September 28, 2005

Elongated gold nanostructures in silica for metamaterials: Technology and optical properties

Proc. SPIE. 5955, Metamaterials

KEYWORDS: Gold, Metamaterials, Nanostructures, Optical properties, Metals, Glasses, Magnetism, Infrared radiation, Nanorods, Nanowires

Read Abstract +

PROCEEDINGS ARTICLE | August 26, 2005

Laser beam filtering by refractive or diffractive microstructures

Proc. SPIE. 5874, Current Developments in Lens Design and Optical Engineering VI

KEYWORDS: Optical filters, Gaussian beams, Silica, Spatial frequencies, Etching, Dielectrics, Interference (communication), Gaussian filters, Dielectric filters, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | August 20, 2005

Low-loss gratings for next-generation gravitational wave detectors

Proc. SPIE. 5870, Advances in Thin-Film Coatings for Optical Applications II

KEYWORDS: Diffraction, Mirrors, Silica, Scattering, Sensors, Dielectrics, Coating, Reflectivity, Scatter measurement, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | August 18, 2005

Hybrid approach to the design of refractive beam shaping elements

Proc. SPIE. 5876, Laser Beam Shaping VI

KEYWORDS: Signal to noise ratio, Optical components, Lithography, Fourier transforms, Wavefronts, Electroluminescence, Transform theory, Beam shaping, Geometrical optics, Chemical elements

Read Abstract +

PROCEEDINGS ARTICLE | March 21, 2005

Highly efficient dielectric gratings for high-power ultrafast femtosecond fiber laser systems

Proc. SPIE. 5714, Commercial and Biomedical Applications of Ultrafast Lasers V

KEYWORDS: Fiber amplifiers, Diffraction, Photonic crystal fibers, Femtosecond phenomena, Silica, Cladding, Dielectrics, Fiber lasers, Laser systems engineering, Diffraction gratings

Read Abstract +

Micromachining applications require high pulse energy (>1μJ) short pulse (<1ps) laser systems at high repetition rates. Rare-earth doped fibers are attractive to generate these target values by the amplification of ultrafast femtosecond seed sources. Two favored techniques have been used: the chirped pulse amplification (CPA) scheme where the pulses are stretched in the time domain to reduce nonlinearity in the amplifier stage and the parabolic pulse amplification scheme where the combined effect of nonlinearity, normal dispersion and gain in the fiber generate linearly chirped parabolic shaped pulses. Both approaches can be scaled to higher power by reducing the nonlinearity in the amplifiers. To achieve this, we discuss novel photonic crystal fiber designs which allow for larger single-mode core diameter and reduced absorption length and therefore reduced nonlinearity. The so generated high average power of >100 W at repetition rate up to several tens of MHz cannot be compressed by gold gratings to femtosecond pulse duration due to thermal heating. We focus on the development of dielectric gratings in fused silica which can handle this power levels due to their high damage threshold. Two kinds of gratings are discussed. Firstly, the transmission gratings with a period of 800 nm were designed to possess 96% diffraction efficiency over a spectral range from 1.03μm to 1.09μm. The fabrication of the rectangular groove profile was done using electron beam lithography and reactive ion beam etching into the fused silica substrate. The measured diffraction efficiency was 96.5% @ 1060nm. Secondly, dielectric reflection gratings, which consist of a dielectric grating on top of a high-reflective layerstack, can theoretically exhibit a diffraction efficiency of even higher than 99%. To achieve this we chose a period of 1060nm. The fabrication was done similar to the transmission gratings, though a HR-coated substrate had to be used instead of the simple fused substrate. The fabricated gratings show a diffraction efficiency of 99.6%. Both are applied to the discussed high power fiber amplifier stages to generate linearly polarized femtosecond pulses at ~100 W average power with a repetition rate of 80 MHz.

PROCEEDINGS ARTICLE | February 7, 2005

High efficiency in beam splitters fabricated over thin film stacks

Proc. SPIE. 5636, Holography, Diffractive Optics, and Applications II

KEYWORDS: Thin films, Diffraction, Refractive index, Antireflective coatings, Beam splitters, Titanium dioxide, Silica, Silicon, Coating, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | January 22, 2005

Dielectric pinholes for laser-beam filtering

Proc. SPIE. 5720, Micromachining Technology for Micro-Optics and Nano-Optics III

KEYWORDS: Optical filters, Gaussian beams, Silica, Spatial frequencies, Etching, Dielectrics, Interference (communication), Gaussian filters, Laser damage threshold, Dielectric filters

Read Abstract +

PROCEEDINGS ARTICLE | September 15, 2004

Lasing in a 2D photonic bandgap structure

Proc. SPIE. 5450, Photonic Crystal Materials and Nanostructures

KEYWORDS: Refractive index, Data modeling, Etching, Quartz, Polymers, Luminescence, Physics, Solids, Optical pumping, Maxwell's equations

Read Abstract +

PROCEEDINGS ARTICLE | July 9, 2004

Highly efficient waveguide bends in low in-plane index contrast photonic crystals

Proc. SPIE. 5360, Photonic Crystal Materials and Devices II

KEYWORDS: Semiconductors, Refractive index, Waveguides, Scattering, Etching, Photonic crystals, Scanning electron microscopy, Wave propagation, Niobium, Reactive ion etching

Read Abstract +

PROCEEDINGS ARTICLE | May 24, 2004

Application of the rigorous treatment for the characterization of sub-micron structures on photomasks

Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII

KEYWORDS: Oxides, Visible radiation, Surface plasmons, Polarization, Reflection, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology, Dielectric polarization

Read Abstract +

PROCEEDINGS ARTICLE | February 26, 2004

Highly efficient polarization-independent transmission gratings for pulse stretching and compression

Proc. SPIE. 5252, Optical Fabrication, Testing, and Metrology

KEYWORDS: Diffraction, Optical design, Beam splitters, Silica, Polarization, Etching, Dielectrics, Chromium, Dielectric polarization, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | December 29, 2003

E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures

Proc. SPIE. 5184, Physics, Theory, and Applications of Periodic Structures in Optics II

KEYWORDS: Optical components, Lithography, Electron beam lithography, Antireflective coatings, Eye, Holography, Photomasks, Binary data, Near field optics, Diffraction gratings

Read Abstract +

SPIE Conference Volume | November 3, 2003

Lithographic and Micromachining Techniques for Optical Component Fabrication II

PROCEEDINGS ARTICLE | November 3, 2003

Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements

Proc. SPIE. 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II

KEYWORDS: Optical components, Lithography, Optical lithography, Glasses, Manufacturing, Photomasks, Beam shaping, Analog electronics, Photoresist processing, Optics manufacturing

Read Abstract +

PROCEEDINGS ARTICLE | November 3, 2003

Polarizing metal stripe gratings for a micro-optical polarimeter

Proc. SPIE. 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II

KEYWORDS: Lithography, Refractive index, Silica, Polarization, Etching, Metals, Coating, Chromium, Polarizers, Polarimetry

Read Abstract +

PROCEEDINGS ARTICLE | November 3, 2003

Alternative method of gray-tone lithography with potential for the fabrication of combined continuous 3D surface profiles and subwavelength structures

Proc. SPIE. 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II

KEYWORDS: Optical components, Lithography, Prisms, Optical lithography, Calibration, Photoresist materials, Photomasks, Photoresist developing, Picture Archiving and Communication System, Absorption

Read Abstract +

PROCEEDINGS ARTICLE | November 3, 2003

Resist hardening without surface deviation

Proc. SPIE. 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II

KEYWORDS: Fabrication, Lithography, Silica, Calibration, Etching, Semiconductor lasers, Photomasks, Beam shaping, Chemical elements, Photoresist processing

Read Abstract +

PROCEEDINGS ARTICLE | November 3, 2003

Micro-optical sensor system for birefringence characterization of textile fibers

Proc. SPIE. 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II

KEYWORDS: Multimode fibers, Optical fibers, Optical components, Optical filters, Electronics, Polarization, Birefringence, Sensors, Polarizers, Humidity

Read Abstract +

PROCEEDINGS ARTICLE | August 14, 2003

Digital planar holography and multiplexer/demultiplexer with discrete dispersion

Proc. SPIE. 5246, Active and Passive Optical Components for WDM Communications III

KEYWORDS: Refractive index, Holograms, Holography, Digital holography, Dispersion, Photonic crystals, Photonics, Planar waveguides, Photonic integrated circuits, Volume holography

Read Abstract +

PROCEEDINGS ARTICLE | June 17, 2003

Photonic bandgap quasi-crystals for integrated WDM devices

Proc. SPIE. 4989, Optical Devices for Fiber Communication IV

KEYWORDS: Infrared cameras, Superposition, Lithography, Mirrors, Fiber Bragg gratings, Manufacturing, Wavelength division multiplexing, Planar waveguides, Volume holography, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | March 3, 2003

Ground-based coronagraphy: performance of a four-quadrant phase mask

Proc. SPIE. 4860, High-Contrast Imaging for Exo-Planet Detection

KEYWORDS: Optical components, Telescopes, Stars, Adaptive optics, Control systems, Coronagraphy, High dynamic range imaging, Optics manufacturing, Device simulation, Nulling interferometry

Read Abstract +

PROCEEDINGS ARTICLE | December 21, 2001

Proximity printing by wave-optically designed masks

Proc. SPIE. 4436, Wave-Optical Systems Engineering

KEYWORDS: Electron beam lithography, Light sources, Phase modulation, Etching, Chromium, Computer simulations, Printing, Photoresist materials, Photomasks, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | November 9, 2001

Investigation of large null-CGH realization

Proc. SPIE. 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication

KEYWORDS: Optical components, Diffraction, Quartz, Wavefronts, Computer generated holography, Aspheric lenses, Beam shaping, Chemical elements, Spherical lenses, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | November 9, 2001

Beam shaping for multimode beams

Proc. SPIE. 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication

KEYWORDS: Multimode fibers, Optical components, Lithography, High power lasers, Materials processing, Wave propagation, Micro optics, Beam shaping, Spherical lenses, Beam propagation method

Read Abstract +

SPIE Conference Volume | November 9, 2001

Lithographic and Micromachining Techniques for Optical Component Fabrication

PROCEEDINGS ARTICLE | November 9, 2001

Fabrication of glass lenses by melting technology

Proc. SPIE. 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication

KEYWORDS: Silica, Etching, Quartz, Dry etching, Glasses, Chromium, Photomasks, Boron, Phosphorus, Spherical lenses

Read Abstract +

PROCEEDINGS ARTICLE | November 9, 2001

Circular dielectric gratings acting as resonators for solid state polymer lasers

Proc. SPIE. 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication

KEYWORDS: Resonators, Etching, Polymers, Photons, Laser resonators, Laser damage threshold, Optical pumping, Laser optics, Laser systems engineering, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | November 9, 2001

Thick refractive beam shaping elements applied to laser diodes

Proc. SPIE. 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication

KEYWORDS: Fabrication, Optical components, Lithography, Electron beams, Surface roughness, Heat treatments, Semiconductor lasers, Wave propagation, Photomasks, Beam shaping

Read Abstract +

PROCEEDINGS ARTICLE | August 20, 2001

High-resolution proximity printing by wave-optically designed masks

Proc. SPIE. 4343, Emerging Lithographic Technologies V

KEYWORDS: Lithography, Diffraction, Optical lithography, Detection and tracking algorithms, Modulation, Chromium, Printing, Photoresist materials, Collimation, Photomasks

Read Abstract +

PROCEEDINGS ARTICLE | April 26, 2001

High-resolution proximity printing by wave-optically designed complex transmission masks

Proc. SPIE. 4404, Lithography for Semiconductor Manufacturing II

KEYWORDS: Electron beam lithography, Light sources, Phase modulation, Etching, Chromium, Computer simulations, Printing, Photoresist materials, Photomasks, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | October 6, 2000

Large-area gratings fabricated by ultrafast e-beam writing

Proc. SPIE. 4231, Advanced Optical Manufacturing and Testing Technology 2000

KEYWORDS: Electron beam lithography, Diffraction, Etching, Error analysis, Wavefronts, Chromium, Beam shaping, Photoresist processing, Binary data, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | October 6, 2000

Fabrication and properties of refractive micro-optical profiles for lenses, lens arrays, and beam-shaping elements

Proc. SPIE. 4231, Advanced Optical Manufacturing and Testing Technology 2000

KEYWORDS: Optical components, Lithography, Lenses, Semiconductor lasers, Wave propagation, Micro optics, Photomasks, Beam shaping, Chemical elements, Spherical lenses

Read Abstract +

PROCEEDINGS ARTICLE | October 6, 2000

Evaluation and suppression of systematic errors in optical subwavelength gratings

Proc. SPIE. 4231, Advanced Optical Manufacturing and Testing Technology 2000

KEYWORDS: Optical components, Lithography, Electron beam lithography, Diffraction, Birefringence, Optical properties, Control systems, Solids, Compound parabolic concentrators, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | August 18, 2000

Experimental realization of a diffractive optical isolator

Proc. SPIE. 4179, Micromachining Technology for Micro-Optics

KEYWORDS: Diffraction, Beam splitters, Polarization, Birefringence, Quartz, Polarizers, Optical isolators, Binary data, Dielectric polarization, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | August 18, 2000

Fabrication of microlens arrays in CaF2 by ion milling

Proc. SPIE. 4179, Micromachining Technology for Micro-Optics

KEYWORDS: Microlens array, Lenses, Etching, Sputter deposition, Ions, Calcium, Surface roughness, Photoresist materials, Ion beams, Microlens

Read Abstract +

PROCEEDINGS ARTICLE | August 18, 2000

Beam-shaping elements for holographic applications

Proc. SPIE. 4179, Micromachining Technology for Micro-Optics

KEYWORDS: Superposition, Optical components, Optical design, Holograms, Holography, Gaussian beams, Wavefronts, Beam shaping, Spherical lenses, Holography applications

Read Abstract +

PROCEEDINGS ARTICLE | August 18, 2000

Fabrication technologies for micro-optical elements with arbitrary surfaces

Proc. SPIE. 4179, Micromachining Technology for Micro-Optics

KEYWORDS: Optical components, Lithography, Diffraction, Optical lithography, Silica, Photoresist materials, Photomasks, Reactive ion etching, Binary data, Multiphoton lithography

Read Abstract +

PROCEEDINGS ARTICLE | August 31, 1999

Approximation of refractive micro-optical profiles by minimal surfaces

Proc. SPIE. 3879, Micromachine Technology for Diffractive and Holographic Optics

KEYWORDS: Fabrication, Signal to noise ratio, Optical components, Lithography, Optical lithography, Photoresist materials, Micro optics, Beam shaping, Chemical elements, Spherical lenses

Read Abstract +

PROCEEDINGS ARTICLE | August 31, 1999

Fabrication technique for high-aspect-ratio gratings

Proc. SPIE. 3879, Micromachine Technology for Diffractive and Holographic Optics

KEYWORDS: Fabrication, Silica, Birefringence, Etching, Coating, Chromium, Ion beams, Photomasks, Phase measurement, Reactive ion etching

Read Abstract +

PROCEEDINGS ARTICLE | August 31, 1999

Fabrication and properties of refractive micro-optical beam-shaping elements

Proc. SPIE. 3879, Micromachine Technology for Diffractive and Holographic Optics

KEYWORDS: Fabrication, Optical components, Lithography, Electron beam lithography, Polymers, Glasses, Micro optics, Photomasks, Beam shaping, Chemical elements

Read Abstract +

PROCEEDINGS ARTICLE | June 1, 1999

Adapting existing e-beam writers to write HEBS-glass gray-scale masks

Proc. SPIE. 3633, Diffractive and Holographic Technologies, Systems, and Spatial Light Modulators VI

KEYWORDS: Lithography, Electron beams, Gaussian beams, Calibration, Glasses, Ions, Silver, Thermal effects, Photomasks, Beam shaping

Read Abstract +

PROCEEDINGS ARTICLE | April 30, 1999

Integration of high power laser diodes with microoptical components in a compact pumping source for visible fiber laser

Proc. SPIE. 3631, Optoelectronic Integrated Circuits and Packaging III

KEYWORDS: High power lasers, Copper, Laser development, Fiber lasers, Semiconductor lasers, Microlens, Diodes, Heatsinks, Prototyping, Diffraction gratings

Read Abstract +

SPIE Journal Paper | February 1, 1999

Study on polarizing visible light by subwavelength-period metal-stripe gratings

Bernd Schnabel, Ernst-Bernhard Kley, Frank Wyrowski

OE Vol. 38 Issue 02

KEYWORDS: Dielectric polarization, Polarization, Metals, Diffraction gratings, Chromium, Etching, Visible radiation, Polarizers, Ion beams, Transmittance

PROCEEDINGS ARTICLE | June 18, 1998

Generation, superposition, and separation of Gauss-Hermite modes by means of DOEs

Proc. SPIE. 3291, Diffractive and Holographic Device Technologies and Applications V

KEYWORDS: Superposition, Optical components, Diffractive optical elements, Modulation, Manufacturing, Transmission electron microscopy, Telecommunications, Chemical elements, Modes of laser operation, Optics manufacturing

Read Abstract +

PROCEEDINGS ARTICLE | April 1, 1998

Fascination and challenge of subwavelength-structured interfaces

Proc. SPIE. 3402, Optical Information Science and Technology (OIST97): Optical Memory and Neural Networks

KEYWORDS: Electron beam lithography, Refractive index, Electron beams, Modulation, Dielectrics, Interfaces, Inspection, Physics, Transmittance, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | March 15, 1998

Complex microprism structures and their application to multichannel fiber optic switches

Proc. SPIE. 3276, Miniaturized Systems with Micro-Optics and Micromechanics III

KEYWORDS: Monochromatic aberrations, Refractive index, Prisms, Switches, Gaussian beams, Switching, Fiber optics, Beam shaping, Tolerancing, Channel projecting optics

Read Abstract +

PROCEEDINGS ARTICLE | March 15, 1998

Fabrication of micro-optical surface profiles by using grayscale masks

Proc. SPIE. 3276, Miniaturized Systems with Micro-Optics and Micromechanics III

KEYWORDS: Fabrication, Lithography, Electron beam lithography, Optical lithography, Lenses, Glasses, Micro optics, Photomasks, Beam shaping, Photoresist processing

Read Abstract +

PROCEEDINGS ARTICLE | November 1, 1997

Ray-tracing-based phase elements as tools for CO2 laser beam profile homogenization: influence of different parameters and ranges of tolerances

Proc. SPIE. 3134, Optical Manufacturing and Testing II

KEYWORDS: Optical components, Diffraction, Gaussian beams, Etching, Manufacturing, Computer simulations, Photomasks, Beam shaping, Chemical elements, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | November 1, 1997

Forming of selected unimodal complex amplitude distributions by means of novel DOEs of MODAN type

Proc. SPIE. 3134, Optical Manufacturing and Testing II

KEYWORDS: Optical components, Energy efficiency, Polymethylmethacrylate, Diffractive optical elements, Manufacturing, Computer simulations, Transform theory, Phase measurement, Chemical elements, Optics manufacturing

Read Abstract +

SPIE Conference Volume | September 24, 1997

Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications

PROCEEDINGS ARTICLE | September 24, 1997

Diffractive optical elements with polarization multiplexing

Proc. SPIE. 3099, Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications

KEYWORDS: Electron beam lithography, Diffractive optical elements, Polarization, Opacity, Metals, Matrices, Chromium, Multiplexing, Binary data, Dielectric polarization

Read Abstract +

PROCEEDINGS ARTICLE | September 22, 1997

Iterative calculation, manufacture, and investigation of DOE forming unimodal complex amplitude distributions

Proc. SPIE. 3110, 10th Meeting on Optical Engineering in Israel

KEYWORDS: Energy efficiency, Polymethylmethacrylate, Diffractive optical elements, Etching, Manufacturing, Interferometry, Computer simulations, Transform theory, Modes of laser operation, Optics manufacturing

Read Abstract +

PROCEEDINGS ARTICLE | May 15, 1997

Potential of e-beam writing for diffractive optics

Proc. SPIE. 3010, Diffractive and Holographic Device Technologies and Applications IV

KEYWORDS: Optical components, Electron beam lithography, Diffraction, Optical design, Interfaces, Microelectronics, Photomasks, Optical simulations, Chemical elements, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | April 11, 1997

Fabrication and application of subwavelength gratings

Proc. SPIE. 3008, Miniaturized Systems with Micro-Optics and Micromechanics II

KEYWORDS: Waveguides, Polarization, Optical properties, Etching, Metals, Dielectrics, Ion beams, Binary data, Dielectric polarization, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | April 11, 1997

E-beam lithography: an efficient tool for the fabrication of diffractive and micro-optical elements

Proc. SPIE. 3008, Miniaturized Systems with Micro-Optics and Micromechanics II

KEYWORDS: Fabrication, Electron beam lithography, Diffraction, Polarization, Lenses, Glasses, Computer generated holography, Photomasks, Chemical elements, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | November 1, 1996

Optical properties of large area diffractive Fresnel-lenses with modified zone-geometry

Proc. SPIE. 2863, Current Developments in Optical Design and Engineering VI

KEYWORDS: Superposition, Lithography, Diffraction, Optical properties, Lenses, Error analysis, Electrons, Physics, Scanning electron microscopy, Cylindrical lenses

Read Abstract +

PROCEEDINGS ARTICLE | November 1, 1996

Application of metallic subwavelength gratings for polarization devices

Proc. SPIE. 2863, Current Developments in Optical Design and Engineering VI

KEYWORDS: Polarization, Lenses, Spectroscopy, Polarimetry, CCD cameras, Charge-coupled devices, Spatial resolution, Chemical elements, Binary data, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | November 1, 1996

Optical characterization method for high-frequency gratings

Proc. SPIE. 2863, Current Developments in Optical Design and Engineering VI

KEYWORDS: Diffraction, Visible radiation, Reflection, Spatial frequencies, Dielectrics, Scanning electron microscopy, Profilometers, Binary data, Dielectric polarization, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | August 26, 1996

Replication of micro-optical profiles in ORMOCER and other polymers

Proc. SPIE. 2783, Micro-Optical Technologies for Measurement, Sensors, and Microsystems

KEYWORDS: Refractive index, Electron beams, Lenses, Polymers, Metals, Silicon, Manufacturing, Chromium, Electroplating, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | August 26, 1996

E-beam tandem writes short-pitch DOEs and gratings for EU-922 FOTA and other optical microsystems

Proc. SPIE. 2783, Micro-Optical Technologies for Measurement, Sensors, and Microsystems

KEYWORDS: Optical components, Electron beam lithography, Electron beams, Holograms, Optical microsystems, Waveguides, Spatial frequencies, Sensors, Photomasks, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | May 7, 1996

Investigation of computer-generated diffractive beam shapers for the task of Gauss-to-ring laser beam transformation

Proc. SPIE. 2689, Diffractive and Holographic Optics Technology III

KEYWORDS: Optical components, Telescopes, Gaussian beams, Cameras, Etching, Manufacturing, Computer simulations, Photomasks, Beam shaping, Optics manufacturing

Read Abstract +

SPIE Journal Paper | May 1, 1996

New diffractive beam shaper generated with the aid of e-beam lithography

Michael Golub, Michael Duparre, Ernst-Bernhard Kley, Richard Kowarschik, Barbara Luedge, Werner Rockstroh, Hans-Joerg Fuchs

OE Vol. 35 Issue 05

KEYWORDS: Beam shaping, Photomasks, Electron beam lithography, Infrared cameras, Gaussian beams, Binary data, Cameras, Optical components, Gas lasers, Optical engineering

PROCEEDINGS ARTICLE | September 26, 1995

E-beam lithography: a suitable technology for fabrication of high-accuracy 2D and 3D surface profiles

Proc. SPIE. 2640, Microlithography and Metrology in Micromachining

KEYWORDS: Electron beam lithography, Electron beams, Holograms, Gaussian beams, Lenses, Computer programming, Compound parabolic concentrators, Micromachining, Beam shaping, Binary data

Read Abstract +

PROCEEDINGS ARTICLE | September 25, 1995

Development of a novel x-ray focusing technique using crystals with a two-dimensionally modulated surfaces

Proc. SPIE. 2516, X-Ray Microbeam Technology and Applications

KEYWORDS: Diffraction, X-ray optics, Modulation, Reflection, Crystals, X-rays, X-ray diffraction, Silicon, Near field diffraction, Geometrical optics

Read Abstract +

PROCEEDINGS ARTICLE | July 28, 1994

Grating couplers in planar polymer waveguides with beam shaping properties

Proc. SPIE. 2213, Nanofabrication Technologies and Device Integration

KEYWORDS: Electron beam lithography, Diffraction, Refractive index, Polymethylmethacrylate, Waveguides, Polymers, Near field, Beam shaping, Polymer multimode waveguides, Diffraction gratings

Read Abstract +

PROCEEDINGS ARTICLE | December 15, 1993

Miniaturized optical systems for beam deflection and modulation

Proc. SPIE. 1992, Miniature and Micro-Optics and Micromechanics

KEYWORDS: Optical components, Microlens array, Switching, Phase modulation, Modulation, Collimation, Micro optics, Microlens, Fresnel lenses, Chemical elements

Read Abstract +