Dr. Erwin Slot
Inventor at MAPPER Lithography
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Silicon, Scanning electron microscopy, Optical scanning, Line width roughness, Optical alignment, Semiconducting wafers, Prototyping, Overlay metrology

Proceedings Article | 22 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Electron beams, Metrology, Lenses, Time metrology, Distance measurement, Process control, Raster graphics, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Electron beam lithography, Electron beams, Line width roughness, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 April 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Lithographic illumination, Photomasks, Integrated optics, Optical alignment, Semiconducting wafers

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Cooling systems, Lithography, Electron beam lithography, Electron beams, Interferometers, Sensors, Interfaces, Manufacturing, Optical alignment, Semiconducting wafers

Showing 5 of 13 publications
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