Dr. Erwin Zoethout
at FOM Institute DIFFER
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Diffraction, Multilayers, Reflection, Imaging systems, Ultraviolet radiation, Silicon, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

PROCEEDINGS ARTICLE | September 27, 2013
Proc. SPIE. 8848, Advances in X-Ray/EUV Optics and Components VIII
KEYWORDS: Lithography, Mirrors, Multilayers, Sputter deposition, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Local area networks, Lanthanum

PROCEEDINGS ARTICLE | September 27, 2013
Proc. SPIE. 8848, Advances in X-Ray/EUV Optics and Components VIII
KEYWORDS: Diffraction, Optical filters, Antireflective coatings, Multilayers, Reflection, Ultraviolet radiation, Silicon, Reflectivity, Extreme ultraviolet, Diffraction gratings

PROCEEDINGS ARTICLE | September 27, 2013
Proc. SPIE. 8848, Advances in X-Ray/EUV Optics and Components VIII
KEYWORDS: Thin films, Mirrors, Antireflective coatings, Multilayers, Deep ultraviolet, Silicon, Reflectivity, Extreme ultraviolet, Optical engineering, Extreme ultraviolet lithography

SPIE Journal Paper | October 19, 2012
JM3 Vol. 11 Issue 4
KEYWORDS: Reflectivity, Mirrors, Local area networks, Multilayers, Extreme ultraviolet lithography, Boron, Interfaces, Extreme ultraviolet, Lithography, Lanthanum

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Mirrors, Multilayers, Interfaces, Reflectivity, Optical testing, Extreme ultraviolet, Boron, Terbium, Extreme ultraviolet lithography

Showing 5 of 15 publications
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