Mr. Ethan Maguire Profile

Ethan Maguire

at Siemens

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Author

Publications (5)

Proceedings Article | 28 April 2023 Paper

Patterning assessment using 0.33NA EUV single mask for next generation DRAM manufacturing

Jeonghoon Lee, Sandip Halder, Van Tuong Pham, Roberto Fallica, Seonggil Heo, Kaushik Sah, Hyo Seon Suh, Victor Blanco, Werner Gillijns, Andrew Cross, Ethan Maguire, Ana-Maria Armeanu, Vladislav Liubich, Evgeny Malankin, Xima Zhang, Monica Kempsell Sears, Neal Lafferty, Germain Fenger, Chih-I Wei, Ryoung Han Kim

Proceedings Volume 12495, 124950S (2023) https://doi.org/10.1117/12.2660763

KEYWORDS: Optical lithography, Extreme ultraviolet, Optical proximity correction, Design and modelling, SRAF, Semiconducting wafers, Inspection, Source mask optimization, Printing, Electronic design automation

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Proceedings Article | 1 December 2022 Poster + Paper

Single mask solution to pattern BLP and SNLP using 0.33NA EUV for next-generation DRAM manufacturing

Kaushik Sah, Andrew Cross, Sayantan Das, Roberto Fallica, Jeonghoon Lee, Ryoung-Han Kim, Sandip Halder, Ethan Maguire, Ana-Maria Armeanu, Monica Sears, Neal Lafferty, Vlad Liubich, Chih-i Wei, Germain Fenger

Proceedings Volume 12292, 122920W (2022) https://doi.org/10.1117/12.2645953

KEYWORDS: Photomasks, Optical proximity correction, Stochastic processes, Extreme ultraviolet, Semiconducting wafers, Wafer-level optics, Source mask optimization, Manufacturing, Inspection, Signal to noise ratio, Defect inspection

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Proceedings Article | 16 September 2022 Paper

EUV SRAFs printing modeling with bright field mask

Chih-I Wei, Azat Latypov, Shuling Wang, Satya Sriram, Prakash Deep, Yunfei Deng, Ethan Maguire, Shumay Shang, Germain Fenger, Werner Gillijns

Proceedings Volume 12325, 1232506 (2022) https://doi.org/10.1117/12.2640532

KEYWORDS: SRAF, Semiconducting wafers, Stochastic processes, Data modeling, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Calibration, Line width roughness

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Proceedings Article | 26 May 2022 Presentation + Paper

E-beam metrology-based EUVL aberration monitoring

Seulki Kang, Yuji Miura, Kotaro Maruyama, Yuichiro Yamazaki, Chih-I Wei, Ethan Macguire, Germain Fenger, Peter De Bisschop, Sayantan Das, Sandip Halder, Gian Lorusso

Proceedings Volume 12053, 120530Z (2022) https://doi.org/10.1117/12.2615955

KEYWORDS: Semiconducting wafers, Error analysis, Metrology, Scanners, Data modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Modulation, Wavefront aberrations

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Proceedings Article | 25 May 2022 Presentation + Paper

EUV based multi-patterning schemes for advanced DRAM nodes

Sayantan Das, Kaushik Sah, Roberto Fallica, Zhijin Chen, Sandip Halder, Andrew Cross, Danilo De Simone, Fergo Treska, Philippe Leray, Ryoung Han Kim, Ethan Maguire, Chih-I Wei, Germain Fenger, Neal Lafferty, Jeonghoon Lee

Proceedings Volume 12055, 1205503 (2022) https://doi.org/10.1117/12.2615644

KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Optical lithography, Double patterning technology

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