Ethan Maguire
at Siemens
SPIE Involvement:
Publications (5)

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124950S (2023)
KEYWORDS: Optical lithography, Extreme ultraviolet, Optical proximity correction, Design and modelling, SRAF, Semiconducting wafers, Inspection, Source mask optimization, Printing, Electronic design automation

Proceedings Article | 1 December 2022 Poster + Paper
Proceedings Volume 12292, 122920W (2022)
KEYWORDS: Photomasks, Optical proximity correction, Stochastic processes, Extreme ultraviolet, Semiconducting wafers, Wafer-level optics, Source mask optimization, Manufacturing, Inspection, Signal to noise ratio, Defect inspection

Proceedings Article | 16 September 2022 Paper
Proceedings Volume 12325, 1232506 (2022)
KEYWORDS: SRAF, Semiconducting wafers, Stochastic processes, Data modeling, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Calibration, Line width roughness

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 120530Z (2022)
KEYWORDS: Semiconducting wafers, Error analysis, Metrology, Scanners, Data modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Modulation, Wavefront aberrations

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12055, 1205503 (2022)
KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Optical lithography, Double patterning technology

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