Eui-Sang Park
Assistant Manager at Photronics Inc
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Cadmium, Modulation, Backscatter, Error analysis, Electrons, Computer simulations, Beam shaping, Critical dimension metrology, Photoresist processing, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Cadmium, Backscatter, Error analysis, Photomasks, Beam shaping, Critical dimension metrology, Vestigial sideband modulation

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Deep ultraviolet, Ultraviolet radiation, Particles, Oxygen, Transmittance, Photomasks, Scanning probe microscopy, Mask cleaning, Industrial chemicals

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Thin films, Electron beams, Backscatter, Etching, Dry etching, Equipment and services, Chromium, Photomasks, Mask making, Critical dimension metrology

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Opacity, Polymers, Inspection, Chromium, Control systems, Platinum, Photomasks, Critical dimension metrology, Vestigial sideband modulation, Chemically amplified resists

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Logic, Photomasks, Logic devices, Critical dimension metrology, Line edge roughness, Photoresist processing, Arsenic, Temperature metrology, Chemically amplified resists

Showing 5 of 10 publications
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