Eun-A Kwak
Graduate Student at Hanyang Univ
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Semiconductors, Diffraction, Refractive index, Finite-difference time-domain method, Lithographic illumination, Polarization, Silicon, Photomasks, Immersion lithography, Binary data

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Coherence imaging, Refractive index, Lithographic illumination, Polarization, Image quality, Photomasks, Immersion lithography, Modulation transfer functions, Resolution enhancement technologies, Liquids

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Lithographic illumination, Scattering, Chromium, Electroluminescence, Photomasks, Optical proximity correction, Binary data, Resolution enhancement technologies, Phase shifts

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