Dr. Eun-Jin Kim
at Hanyang Univ
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Nickel, Silicon, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Zirconium, Temperature metrology

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Thin films, Lithography, Contamination, Silicon, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Thermal modeling, Absorption

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Thin films, Lithography, Data modeling, Silicon, Distortion, Computer simulations, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Optical lithography, Contamination, Image processing, Reflectivity, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Proceedings Article | 14 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Refractive index, Lithographic illumination, Photomasks, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Liquids

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Coherence (optics), Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Resolution enhancement technologies

Showing 5 of 13 publications
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