Ms. Eun Kyung Son
at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Polymers, Molecules, Diffusion, Photoresist materials, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Electrodes, Polymers, Diffusion, Resistance, Photoresist materials, Optical proximity correction, Semiconducting wafers, Quenching (fluorescence)

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Polymers, Silicon, Diffusion, Scanning electron microscopy, Electronic components, Photoresist materials, Photoresist processing, Semiconducting wafers, Photorefractive polymers

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Polymers, Molecules, Silicon, Diffusion, Electroluminescence, Silicon films, Semiconducting wafers, Polymer thin films, Chemically amplified resists

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