Eun-Mi Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (9)

Proceedings Article | 22 March 2010 Paper
Jung-Hoon Ser, Tae-Hoon Park, Moon-Gyu Jeong, Eun-Mi Lee, Sung-Woo Lee, Chun-Suk Suh, Seong-Woon Choi, Chan-Hoon Park, Joo-Tae Moon
Proceedings Volume 7640, 76401T (2010)
KEYWORDS: 3D modeling, Optical proximity correction, Photomasks, Cadmium, Semiconducting wafers, Scanning electron microscopy, Semiconductors, Electronics, Scanners, Lithography

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560L (2006)
KEYWORDS: Optical proximity correction, Design for manufacturing, Photomasks, Semiconducting wafers, Visualization, Image quality, Lithography, Manufacturing, Image processing, Critical dimension metrology

Proceedings Article | 23 February 2006 Paper
Mike Lee, Eun-Mi Lee, Byung Lok Cho, Kamran Eshraghian, Yun-Hyun Kim
Proceedings Volume 6082, 60820F (2006)
KEYWORDS: Antennas, Telecommunications, Control systems, Endoscopes, Video, Wireless communications, Nanotechnology, Surgery, Transceivers, Light emitting diodes

Proceedings Article | 10 May 2005 Paper
S. Suh, I. Kim, E. Lee, Y. Kang, S. Lee, S. Woo, H. Cho
Proceedings Volume 5752, (2005)
KEYWORDS: Optical proximity correction, Scatterometry, Metrology, Data modeling, Semiconducting wafers, Critical dimension metrology, Model-based design, Optical testing, Inspection, Calibration

Proceedings Article | 24 May 2004 Paper
Proceedings Volume 5375, (2004)
KEYWORDS: Optical proximity correction, Critical dimension metrology, Atrial fibrillation, Cadmium, Resolution enhancement technologies, Data modeling, Logic devices, Photomasks, Line edge roughness, Scanning electron microscopy

Showing 5 of 9 publications
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