Eun-Mi Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 22 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Semiconductors, Lithography, Electronics, Cadmium, Scanners, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 14 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Visualization, Image processing, Manufacturing, Image quality, Design for manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 February 2006
Proc. SPIE. 6082, Endoscopic Microscopy
KEYWORDS: Nanotechnology, Transceivers, Light emitting diodes, Surgery, Video, Control systems, Endoscopes, Telecommunications, Antennas, Wireless communications

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Data modeling, Calibration, Inspection, Optical testing, Scatterometry, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Atrial fibrillation, Cadmium, Data modeling, Scanning electron microscopy, Photomasks, Logic devices, Optical proximity correction, Critical dimension metrology, Line edge roughness, Resolution enhancement technologies

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Semiconductors, Reticles, Optical lithography, Contamination, Scattering, Light scattering, Projection systems, Photomasks, Critical dimension metrology, Standards development

Showing 5 of 9 publications
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