Ms. Eun-Sang Park Profile

Eun-Sang Park

at Hanyang Univ

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Author

Publications (9)

Proceedings Article | 26 September 2019 Paper

Pattern dependent distortion and temperature variation in EUV mask

Chung-Hyun Ban, Eun-Sang Park, Ui-Jeong Ha, Chae-Yun Lim, Hye-Keun Oh

Proceedings Volume 11147, 111471R (2019) https://doi.org/10.1117/12.2536721

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Semiconductors, Cooling systems, High volume manufacturing, Pellicles, Mirrors, Overlay metrology

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Proceedings Article | 22 March 2018 Paper

Thermomechanical changes of EUV mask and absorber dependency

Chung-Hyun Ban, Sung-Gyu Lee, Eun-Sang Park, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10583, 1058322 (2018) https://doi.org/10.1117/12.2299495

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Finite element methods, Computer simulations, Multilayers, Image processing, Semiconducting wafers, Tantalum, Nickel

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SPIE Journal Paper | 29 December 2017

Thermo-optical optimization of extreme-ultraviolet pellicles for future generations

Eun-Sang Park, Chung-hyun Ban, Jae-Hun Park, Hye-Keun Oh

JM3, Vol. 16, Issue 04, 041014, (December 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041014

KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Ruthenium, Silicon, Extreme ultraviolet lithography, Absorption, Photomasks, Finite element methods, Multilayers

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Proceedings Article | 16 October 2017 Paper

Lifetime impact on residual stress of EUV pellicle

Min-Woo Kim, Sung-Gyu Lee, Eun-Sang Park, Hye-Keun Oh

Proceedings Volume 10450, 104501O (2017) https://doi.org/10.1117/12.2280692

KEYWORDS: Pellicles, Silicon carbide, Silicon, Ruthenium, Extreme ultraviolet, Finite element methods, Extreme ultraviolet lithography, Manufacturing, Silica, Photomasks

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Proceedings Article | 16 October 2017 Paper

Thermo-mechanical behavior analysis of extreme-ultraviolet pellicle cooling with H2 flow

Myung-Gi Kang, Sung-Gyu Lee, Eun-Sang Park, Hye-Keun Oh

Proceedings Volume 10450, 104501N (2017) https://doi.org/10.1117/12.2280691

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Convection, Cooling systems, Finite element methods, Silicon, Hydrogen, Photomasks, Radiation effects

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Proceedings Article | 16 October 2017 Paper

Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis

Eun-Sang Park, Chung-Hyun Ban, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10450, 104501K (2017) https://doi.org/10.1117/12.2280518

KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Extreme ultraviolet lithography, Silicon, Finite element methods, Graphene, Manufacturing, Ruthenium, Absorption

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Proceedings Article | 4 October 2016 Paper

Mechanical stress induced by external forces in the extreme ultraviolet pellicle

Hyun-Ju Lee, Eun-Sang Park, In-Seon Kim, Hye-Keun Oh

Proceedings Volume 9985, 99851K (2016) https://doi.org/10.1117/12.2242174

KEYWORDS: Pellicles, Extreme ultraviolet, Finite element methods, Scanners, Silicon, Protactinium, Graphene, Zirconium, Silicon carbide, Molybdenum

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Proceedings Article | 10 May 2016 Paper

The impact of the residual stress on the EUV pellicle

Eun-Sang Park, Jae-Keun Choi, Min-Ha Kim, Sollee Hwang, Zahid Hussain Shamsi, Dai-Gyoung Kim, Hye-Keun Oh

Proceedings Volume 9984, 99840F (2016) https://doi.org/10.1117/12.2241276

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Manufacturing, Photomasks, Heat flux, Mirrors, Reflectivity, Thin films, Optical lithography

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Proceedings Article | 18 March 2016 Paper

Stress-induced pellicle analysis for extreme-ultraviolet lithography

Eun-Sang Park, Min-Ha Kim, Sollee Hwang, Jung Hwan Kim, Hye-Keun Oh

Proceedings Volume 9776, 977626 (2016) https://doi.org/10.1117/12.2218219

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Lithography, Silicon, Finite element methods, Image quality, High volume manufacturing, Safety

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Showing 5 of 9 publications

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