Eun-Sang Park
at Hanyang Univ
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Semiconductors, Cooling systems, High volume manufacturing, Pellicles, Mirrors, Overlay metrology

Proceedings Article | 22 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Finite element methods, Computer simulations, Multilayers, Image processing, Semiconducting wafers, Tantalum, Nickel

SPIE Journal Paper | 29 December 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Ruthenium, Silicon, Extreme ultraviolet lithography, Absorption, Photomasks, Finite element methods, Multilayers

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Extreme ultraviolet lithography, Silicon, Finite element methods, Graphene, Manufacturing, Ruthenium, Absorption

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Convection, Cooling systems, Finite element methods, Silicon, Hydrogen, Photomasks, Radiation effects

Showing 5 of 9 publications
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